JPH0262857B2 - - Google Patents

Info

Publication number
JPH0262857B2
JPH0262857B2 JP12925184A JP12925184A JPH0262857B2 JP H0262857 B2 JPH0262857 B2 JP H0262857B2 JP 12925184 A JP12925184 A JP 12925184A JP 12925184 A JP12925184 A JP 12925184A JP H0262857 B2 JPH0262857 B2 JP H0262857B2
Authority
JP
Japan
Prior art keywords
printing plate
phenol
silicone rubber
photosensitive layer
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12925184A
Other languages
English (en)
Japanese (ja)
Other versions
JPS619654A (ja
Inventor
Mikio Tsuda
Masaya Asano
Norio Kawabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP12925184A priority Critical patent/JPS619654A/ja
Publication of JPS619654A publication Critical patent/JPS619654A/ja
Publication of JPH0262857B2 publication Critical patent/JPH0262857B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0752Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12925184A 1984-06-25 1984-06-25 水なし平版印刷版 Granted JPS619654A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12925184A JPS619654A (ja) 1984-06-25 1984-06-25 水なし平版印刷版

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12925184A JPS619654A (ja) 1984-06-25 1984-06-25 水なし平版印刷版

Publications (2)

Publication Number Publication Date
JPS619654A JPS619654A (ja) 1986-01-17
JPH0262857B2 true JPH0262857B2 (en]) 1990-12-26

Family

ID=15004940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12925184A Granted JPS619654A (ja) 1984-06-25 1984-06-25 水なし平版印刷版

Country Status (1)

Country Link
JP (1) JPS619654A (en])

Also Published As

Publication number Publication date
JPS619654A (ja) 1986-01-17

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